适合人群:Researchers in materials science, engineers, physicists, nanotechnology professionals, graduate students, and academic faculty interested in the application and development of laser chemical vapor deposition techniques
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Theory and Application of Laser Chemical Vapor Deposition分类索引数据信息
ISBN:9780306449369
出版日期:1995-10-31 适合人群:Researchers in materials science, engineers, physicists, nanotechnology professionals, graduate students, and academic faculty interested in the application and development of laser chemical vapor deposition techniques